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Vacuum Applications |
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Vacuum Technology Development and Prospects |
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The 20th century industrial vacuum extremely significant development is causing concern. Vacuum Science and Technology is an experimental technique in scientific research. In modern industrial production has become a basic technology to be widely applied.
Vacuum industry so that they can put the blame on technical aspects of the major inventions or found? Not. Vacuum and industrial development of the world only because of the vacuum in the field of industrial technology, the other demand increased. If the vacuum equipment manufacturers for sales in Japan, the electronics industry accounts for 40%. Note this area is the increase in demand for vacuum technology.
After entering the 21st century, and how the development of industrial vacuum, 's development needs, then what is it? in the development of science and technology today, Vacuum Technology will play a new role? also made new achievements? This unknown issue is a cause for concern. worth considering.
We talk about the development trends in vacuum technology, often to find information on theses and patents. to understand the physical phenomena of vacuum, vacuum measuring instruments, and the progress was so. Now we should change from past practice, we must seize the demand vacuum, Looking from this angle to the development trends in vacuum technology. That is, should explore some key areas of the vacuum and vacuum technology, Prospects for the 21st century to the vacuum technology development trends.
First, the need to continue to expand the application of a vacuum "in the 21st century . Vacuum increase or decrease the demand? How will the future development trend? It will depend mainly on whether to increase the vacuum fields, demand growth.
In 20-30 years ago, vacuum books on the application of vacuum technology : First, the pressure on poor The second is to remove interference or molecular electronics space, and the third is to reduce the number of particles on the surface.For the respective needs, the vacuum of course different.The so-called exclusion space obstacles that the average particle size characteristics of the device than a long-range free. 。Vacuum, vacuum valves and the accelerator is the use of this feature.In addition to the high-power electron tubes, causing most of the other solid components, so that there is no longer a need for a vacuum.Nuanshuiping vacuum technology in daily life is an important application that would be able to produce excellent insulation materials, He was cheap, then vacuum in Nuanshuiping will lose their role in the production process.From the surface to reduce the need for 6870 frequency, ultrahigh vacuum technology will be developed. It will maintain its clean surface for long periods. Currently, the application of vacuum technology features : the use of vacuum environment to develop new materials and new technology.So further expansion of the vacuum fields, such as nano-particles and the production of superfine powder and solid components of the development process. Another application is to reduce the chemical reaction process, and the fusion reaction impurity, and sometimes have to use a vacuum. The vacuum chamber wall itself has an extremely close relationship with the reaction process.
It will be expanded, the demand for vacuum. Japanese companies such as Mitsui produce aluminum incorporation of lead, aluminum and the use of high temperature evaporation, This method will expand the use of vacuum Aluminum demand. Therefore, the vacuum equipment factory will be a great vacuum in the market. Aluminum Electrolytic past, we are studying the smelter reduction. Reduction within the furnace, refractories and aluminum due to the mix makes the separation extremely difficult.If the aluminum smelter, which impurity dissolved in the solution will be able to lead and lead-containing impurity separated. The resulting vacuum can be separated from the mixture of aluminum lead. This shows that the emergence of new technology that will directly affect vacuum industry, the demand for vacuum will also increase drastically. A few years ago there Vacuum Process Magnesium, so once the slide production plant vacuum pump and vacuum pumps supply valve. Cause abnormal development. This also illustrates a problem that new technology, new materials, this is bound to promote the development of industries such as a vacuum.
In the Twenty-First Century, the surface treatment technology to become a large surface area of application of a vacuum. Because of the reliability of materials, in particular the application of surface technology will increase. Now people like to use anti-rust, oxidation resistant materials. Though aluminum alloy produced, but little improvement on the original process, the performance will be greatly improved, If the atmospheric oxidation film material and separated, these users will be able to meet the requirements.Such situations, and suggested that some vacuum manufacturers cooperation will be able to open up a considerable market. Another example is ultra-pure aluminum foil for the past very consuming, and yet it applied to the vacuum equipment in the production process, bound to be better to ultrapure foil.If manufacturers can actively participate in this vacuum applied to the field, it will greatly enhance the demand for vacuum.
Future of electronic technology will continue to increase the demand for vacuum.As a vacuum is a very pure space, and electronic components of the production process also requires pure, Therefore vacuum is an ideal environment for the production of electronic components. Such as molecular beam epitaxy, semiconductor products are conducted in a vacuum.
Molecular Beam Epitaxy seem to engage in ultra-large-scale integrated circuits for the goal.To achieve this goal requires a very fine structure.Under such circumstances, the biggest obstacle is the dust. If the series can operate in a vacuum, from the film to enter the vacuum chamber for final disposal is the best vacuum is completed.How to remove dust, the first element is to avoid direct contact with people. 。However, vacuum equipment is not necessarily cleaner. Generally believed that gas, dust emission, or switching the switch will be set, there are still certain problems. Sometimes devices also need to engage in a clean surface, clean the surface is extremely vulnerable to pollution. When necessary to maintain clean surface water, a controlled environment than gas at ultrahigh vacuum better. To fully into the gas to ensure cleanliness, it is necessary to adequately deal with this end, they then swapped into clean gas. For example, in the vacuum sputtering film is not high. However filled with gas before the end of this pressure will greatly affect the quality of the film. So sputtering equipment necessary to create a favorable background vacuum.
Sometimes swapped into other gases, causing a slight decline vacuum, However, a slight change in vacuum conditions, will be able to conduct the same operation. A vacuum in vacuum technology not only to establish a narrow, high-purity gas production, longer controlled environment necessary to maintain the surface, This vacuum technology.If so, it is even more widespread application of vacuum technology.
It seems we can use as a tool for vacuum equipment. High demand for products with the people, the urgent need for a more simple vacuum technology, also used in the hi-tech field. Therefore, the vacuum technology in the 21st century will continue to develop.
Second, the use of vacuum technology in the area of energy . Recently, It has been gradually fading concern of the energy crisis, but have failed to resolve the fundamental issue of how. Energy is a long-term, important issues should not be optimistic.From a long-term point of view, to be replaced by new energy sources, energy research. If the use of solar technology in the near future, it is possible to achieve practical use. Japan had proposed that in 1990, 2% of total energy requirements will be replaced by a new energy. As a practical fusion device to achieve the goal of the Twenty-First Century. Now countries are engaging in the use of solar thermal technology. Typical use of solar thermal technology of solar thermal power generation systems.
Japan in 1981 in Kagawa County completed its first experimental 1MW solar thermal power plants. Surface condenser tower and the condenser used in two ways. These two modes are the rated output of 1000. In the United States, France, Russia, Germany, Spain and Italy have become the research and development of solar thermal power plants included in the state plan. The capacity of these factories 500kW~10MW and completed application.
Solar thermal power generation system is formed by thermal devices, heat transfer tube, regenerative devices Measuring up generators and control devices.
Solar thermal power generation with the thermal poly wide temperature range, about 150~550 ℃. To obtain the heat above 150 ° C, it must be condenser device. Focusing there are many ways, but most are using mirrors. Use materials such as aluminum and silver mirror. Surface Mirror exposed to the atmosphere due to the membrane surface by oxidation and the influence of factors such as friction, the lower rate would reflection.Black face mask defects is the interface between the substrate and the membrane surface, the pollution has occurred.
Recently, due to the production of polymer materials with good reproducibility of flexible, high transmittance, can be mass-produced low cost and has attracted attention.
Effective utilization of solar energy absorbed choice facing extremely important.Making the choice of absorbing surface, using a vacuum technique. Poly used a high-temperature poly heat pipe heat. To prevent formed by the convection of heat pipe, poly covered with transparent glass tube heat pipe outside the glass tube to maintain the vacuum state.
The following principles will choose selective absorption surface of the optical absorption, divided as follows :
(1) the use of a semiconductor film based on the absorption bands arising from the relocation.
In areas with high infrared reflectivity of the surface, put a layer absorption wavelength of 1 ~ semiconductor film, made on the choice of absorbing surface. Si, Cu, PbS, Ge, CuO, as semiconductor materials such as Cr films. This structure of the membrane, it can absorb sunlight into heat; Is transparent to infra-red body. As the metal surface emissivity change makes the role of small, we can make more effective use of solar energy. As Si, Ge high refractive index of sunlight, applying the anti-reflection films and other material to SiO 2. The absorption of sunlight rate of improvement.
(2) reduce the formation of thin interference reflection effect.
Made with high reflectance in the substrate metal layer stack interfere in the membrane filters. Dielectric membrane filters interference from metal membrane + + translucent dielectric membrane components. The membrane structure like this, the visible absorption in the dielectric film, and infrared filters through the intervention rate by the radioactive metal membrane surface reflectivity smaller.
Adopt this approach as an example : the choice of absorbing surface /MO/Al /MO substrate. and the use of optical interference effect of a high temperature resistance of the monolayer excellent metal carbides, nitrides, ZrCx. HfCx other. Make Groove parabolic mirror traps (with ZrCx/Zr choice absorber).
(3) using the reflective properties of the surface and the formation of membrane structures and the relationship between wavelength.
In individual and processed into a ditch on the surface, the vertical incidence of the rays of the sun, the gap between the individual and in the ditch, After repeated reflection and absorption.
This surface will be heated to high temperatures caused performance degradation, and the reason may be due to evaporation, thermal decomposition. Offloading and thermal expansion caused by changes in the surface composition. chemical reaction caused by ultraviolet radiation or mechanical damage caused by other factors.
Solar use of technology is to use sunlight to generate electricity, it is through the solar sun, DC into AC first to be converted to another use.
Change is to direct sunlight for solar energy components.
Such use of solar technology has been used in the past only satellite universe, the lamp power supply and communication in remote areas. 。Now the price is still higher (data reported in Japan in 1984, when the price of 3000 yen / W). Therefore, the scope is limited.
The main material in the solar cell can be examined and improved, and to reduce the cost of solar cells. Improved production of solar cell production process, this technology will be further developed. If Japan had been on the individual residential 3Kw, 20Kw collective residential school 200Kw device lOOKw 1000Kw focus on the installation and use of factory capacity devices for the study. Most of the power of these devices will eventually be connected to the power system development, combined with existing plants operating, to shape the direction of development of the integrated power system deployment.
The manufacture of amorphous silicon solar cells, such as glow discharge decomposition method, reactive sputtering method, vacuum evaporation. the use of vacuum technology.
: Diluted glow discharge decomposition of hydrogen and argon to join other low-pressure silane gas caused glow In plasma decomposition of silane, will accumulate in low-temperature Si substrates.
Another response is as crystalline silicon cathode sputtering : put in 10 -3 to 10 1 child-gas activity, coupled with high voltage discharge it. Discharge is produced by ion bombardment of cathode sputtering cathode material was out.If a piece of hypothermia resettlement in the vicinity of cathode substrate, the substrate amorphous silicon film will be accumulated.
Solar requires not only efficient, low-cost and large-scale features but also exposed under natural conditions with good stability.
Si many advantages, in glass, stainless steel and plastic substrates make a large area of cheap film; Light absorption coefficient than silicon crystal, wide bandwidth than crystalline silicon.
Fusion is the future of humanity and reliable energy, it is the realization of the aspirations of people around the world. Currently, the world's most advanced magnetic-closed Tokamak fusion device, developed in many countries. American TFTR type being developed, produced JET-European Community, a Russian made T-15. Japan developed a JT-60 tokamak-type fusion device.
The construction and operation of large-scale fusion device, greatly promoting the development of high and new technology, particularly in vacuum technology, hypothermia, magnet technology, high power pulse power technology and RF heating technology and remote handling technology.
Fusion device, the vacuum chamber for high temperature plasma prolonged inclusive. For example, the European Union, Central JET vacuum chamber is a double-walled structure of the entire welding ring containers. Total volume of 200m 3, 8000 Weld total length. This vacuum chamber leak rate is low, at room temperature and 500 ° C to meet more than 3,000 years into the vacuum chamber l or an insignificant gas leak rate. Controlled fusion device with high vacuum and cryogenic pumps used turbo molecular pump, the former for the detection, the latter is used in irrigation fusion reaction from the main pump. Adsorbent parameter to work with the cryogenic pumps, which use the remaining emissions. Apart from the nuclear reaction isotope helium ash, there are large quantities of deuterium and tritium in the nuclear reaction. The further recall of deuterium and tritium into the big ring vacuum chamber, in addition to environmental requirements by tritium gas emissions outside the impurities out.
This device, available through international cooperation, research, mankind in the Twenty-First Century is expected to a deuterium - tritium fusion demonstration power plant built. The ultimate goal is to provide marketing fusion power station ment for energy and economic development in the new century, and make due contributions.
Vacuum plasma science and technology and the development of science and technology will be coordinated. It will explore the structure of the universe, the origin of major basic scientific research and material plays an important role.
Third, the expectations of the future development of the vacuum technology "vacuum technology BR> expectations for the future, My first hope is convenient, durable equipment manufacturers can develop toward the direction of satisfied users and manufacturers.To facilitate the operation, or to shorten the production cycle time operation.Vacuum because the time spent in a very long time, therefore to be addressed.
Advanced vacuum devices and instruments to improve the life expectancy and precision equipment. 。In the vacuum of space to build factories. Station and the spacecraft will release its own gas, a vacuum is not satisfactory. After 100 meters away from the spacecraft in space can be an ideal place ultrahigh vacuum. Under the microgravity conditions of the universe using a vacuum environment, the service of humanity.
Aluminum alloy vacuum device may replace stainless steel. 。Realize aluminum alloy vacuum devices, hardness issue can be achieved using ion plating practical.
Vacuum technology of the 21st century will be an important technology has been used to continue to exist and develop.
The future development direction, on the one hand, to the field of micro (nano-technology and the development of solid components). Another is the huge areas (such as fusion research). In the huge variety of devices and the use of vacuum gas installations. hope can be used to develop viscous flow from the field to the wide area ultrahigh vacuum-pump. Baking can be developed without hope of curing or ultrahigh vacuum device on the 100 ℃.Word in a user-friendly operation as a starting point, to be welcomed by users worldwide.
We hope the 21st century update of the vacuum science and technology achievements. Vacuum sectors and greater development.
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